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Department of Thin Films Physics, Institute of Magnetism

Research Facilities

Facilities for fabrication and characterization of the multicomponent film structures



Modernized vacuum deposition installation "VU-2M":
- fabrication of multilayered metallic, insulating, metal-insulating, metal-semiconducting thin film structures, as well as various kinds of multicomponent films;
- 2 multiposition electron-beam evaporators, resistive evaporator;
- mass-spectrometer, 2 quartz sensors for the film thickness control, system for spectrophotometric control of the film thickness;
- system for ionic etching of films and clearing of substrates, monitoring of the working gas pressure, system for cooling and heating of substrates;
- working gas pressure: 10-4 Pa;
- range of substrate temperatures: - 77 K to 1270 K;
- controlled value of the deposition rate: 0.001 nm/s to 100 nm/s.




Ultrahigh-vacuum deposition installation "SVVU-1M":
- fabrication of multilayered metallic, insulating, metal-insulating, metal-semiconducting thin film structures under the ultrahigh-vacuum conditions;
- multiposition electron-beam evaporator, resistive evaporator;
- mass-spectrometer, high-precision quartz sensor for the film thickness control;
- system for ionic clearing of substrates, monitoring of the working gas pressure, system for cooling and heating of substrates;
- working gas pressure: 10-7 Pa;
- range of substrate temperatures: - 77 K to 670 K;
- controlled value of the deposition rate: 0.001 nm/s to 100 nm/s.




RF magnetron sputtering installation "Cathode-1M":
- fabrication of multilayered metallic, insulating, metal-insulating, metal-semiconducting thin film structures, as well as various kinds of multicomponent films;
- 3 RF and 2 DC magnetron evaporators;
- in situ monitoring of the film thickness and resistance;
- automatic maintenance of the working gas pressure (two-channel pressure monitoring);
- up to 36 substrates;
- control of RF output power from 0.5 to 2.8 kW.





Modernized deposition installation on the base of VUP-5M setup:
- fabrication of multilayered structures by means of DC magnetron sputtering;
- 3 DC magnetron evaporators;
- control of substrate temperature from 273 to 1073 K;
- automatic maintenance of the working gas pressure.





LEF-3M-1 ellipsometer:
- measurement of optical characteristics of the surfaces of both transparent and opaque media;
- control of optical parameters and thickness of metallic, insulating and semiconducting films;
- testing of quality of the substrate surface treatment.





Transmission electron microscope PEM-100:
- investigation of microstructure and phase composition of objects;
- resolution: 0.35 nm;
- range of electron-optical magnification: 30 to 400000;
- values of accelerating voltage: 25 kV, 50 kV, 75 kV, 100 kV.



Facilities for investigation of the multicomponent film structures




X-band EPR radiospectrometer SE/X-2544 Radiopan:
- operating frequency range: 8.5 - 10 GHz;
- frequencies of the external magnetic field modulation: 100 kHz, 25 kHz and 80 Hz;
- working temperature range: 77 - 400 K.





NMR spin-echo spectrometer:
- operating frequency range: 10 MHz - 4 GHz;
- working temperature range: 2.2 - 300 K;
- power of the RF probing pulses: 10 W - 10 kW.





Torque magnetometer:
- measurements of the film anisotropy constants;
- magnetization hysteresis loop measurements within the field range from -23 kOe to 23 kOe.





Magnetooptical spectrometer:
- measurements of reflectivity as well as absorption spectra within the wave-length range from 260 to 1200 nm;
- measurements in magnetic fields up to 1.2 T;
- magnetooptical rotation angle resolution: 0.02 degree.





Vibrating sample magnetometer:
- sensitivity: 10-5 emu;
- measurements in magnetic fields up to 20 kOe.





Setup for measurements of magnetoacoustic and magnetoresistive characteristics of materials:
- acoustic oscillation frequency range from 10 Hz to 1 GHz;
- measurements in magnetic fields up to 1 T;
- working temperature range: 10 -150 C.





Kerr magnetopolarimeter:
- the wave-length of the laser beam: 633 nm;
- hysteresis loop measurements within the field range from -18 kOe to 18 kOe.



Setup for electric and magnetoresistive measurements:
- measurements of electric resistance as a function of temperature and magnetic field;
- working temperature range: 77 - 400 K;
- measurements in magnetic fields up to 1.8 T.



INSTITUTE OF MAGNETISM NASU and MESYSU 2013